Rabu, 23 Juni 2010

Download Photochemical Vapor Deposition (Chemical Analysis: A Series of Monographs on Analytical Chemistry and Its Applications)

Download Photochemical Vapor Deposition (Chemical Analysis: A Series of Monographs on Analytical Chemistry and Its Applications)

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Photochemical Vapor Deposition (Chemical Analysis: A Series of Monographs on Analytical Chemistry and Its Applications)

Photochemical Vapor Deposition (Chemical Analysis: A Series of Monographs on Analytical Chemistry and Its Applications)


Photochemical Vapor Deposition (Chemical Analysis: A Series of Monographs on Analytical Chemistry and Its Applications)


Download Photochemical Vapor Deposition (Chemical Analysis: A Series of Monographs on Analytical Chemistry and Its Applications)

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Photochemical Vapor Deposition (Chemical Analysis: A Series of Monographs on Analytical Chemistry and Its Applications)

From the Publisher

Offers an extremely useful overview of photochemical vapor desposition--its characteristics and potential--focusing on the properties of films that have been created by this versatile modern technique plus a thorough description of the conditions under which they were grown. Uses the approach that while photochemical vapor deposition (photo-CVD) is not the solution to all low temperature deposition methodologies, it does provide an added dimension of flexibility to and control over the growth process and has been proven to be valuable for those materials and growth steps in device fabrication that are sensitive to the processing temperature. Whenever applicable, the properties of electronic devices incorporating photo-CVD films are presented and numerous tables detail the deposition parameters as well as electrical and structural properties of the films of specific materials.

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From the Inside Flap

Chemical vapor deposition (CVD) has proven to be enormously successful as a means of producing thin films for a wide array of advanced materials applications. Abrasion-resistant coatings, epitaxial layers for semiconductor lasers and MOS transistors, and low scatter films for optical components such as mirrors and beamsplitters, all rely on the ability of CVD to deposit films of controllable composition and uniform thickness. Photochemical vapor deposition (photo-CVD) is a recent offshoot of CVD that influences the rate and products of the deposition process with light. Introducing visible, ultraviolet, or vacuum ultraviolet photons to the CVD reactor opens new possibilities for reducing film growth temperatures and for producing novel materials. The purpose of this book is to provide an overview of photochemical vapor deposition, with emphasis on the versatility of this new technique for growing metal, dielectric and semiconductor films. Applications receiving special attention include the photodeposition of dielectric films for the fabrication of VLSI devices and the growth of amorphous hydrogenated silicon for photovoltaic applications. Introductory material describing the basic principles underlying photo-CVD is the subject of the first two chapters. Chapter 3 addresses several practical aspects of designing photo-CVD systems and choosing an optical source, in particular, Following chapters discuss the current status of metal, semiconductor, and dielectric films that have been grown by photo-CVD; and the growth of other materials such as polymers and metal oxides composing the Bi-Sr-Ca-Cu-O high Tc superconductor system. Also included are a discussion of the application of photo-CVD to the fabrication of multilayer, short wavelength mirrors, and a review of light-enhanced surface processing such as cleaning and nitridation. The book concludes with an assessment of the future of photodeposition. Designed to be highly readable and easily adapted to the needs of a diverse audience, Photochemical Vapor Deposition will be especially valuable for the student approaching photodeposition for the first time, the thin film engineer evaluating photo-CVD for a particular application, and the experienced researcher who desires a review of the work completed to date. In addition, materials scientists and engineers or physical and analytical chemists who are applying photo-CVD to the synthesis of advanced materials will find this book to be an indispensable addition to their working libraries.

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Product details

Series: Chemical Analysis: A Series of Monographs on Analytical Chemistry and Its Applications (Book 168)

Paperback: 208 pages

Publisher: Wiley-Interscience; 1 edition (September 1992)

Language: English

ISBN-10: 0471550833

ISBN-13: 978-0471550839

Product Dimensions:

6.3 x 0.8 x 9.2 inches

Shipping Weight: 1.1 pounds (View shipping rates and policies)

Average Customer Review:

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Amazon Best Sellers Rank:

#10,109,411 in Books (See Top 100 in Books)

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